Michael Darius Eastwood - Independent AI alignment researcher

Published 29 July 2026

Convergence 32: China EUV Lithography Progress Update

China's reported EUV lithography progress provides a mid-term checkpoint for the semiconductor chokepoint persistence prediction.

Part of the ARC-Eden research programme. Anchored by Infinite Architects (ISBN 978-1806056200, 2 January 2026) and the 23-paper OSF suite (DOI 10.17605/OSF.IO/6C5XB). Evidence anchored: 8 December 2024 manuscript (SHA-256: f0d1f38f).

References

• Priority claims ledger
• Predictions Observatory
• Research paper suite
• Concept index

Cite

Eastwood, M. D. (2026). "Convergence 32: China EUV Lithography Progress Update." https://www.michaeldariuseastwood.com/research/blog/convergence-32-china-euv-lithography-progress-update.html

See the full archive or research hub.